Search results for "general [BL Lacertae objects]"

showing 10 items of 27644 documents

Induced crystallographic changes in Cd1−xZnxO films grown on r-sapphire by AP-MOCVD: the effects of the Zn content when x ≤ 0.5

2020

High-resolution X-ray diffraction, scanning electron microscopy and transmission electron microscopy techniques were used to investigate, as a function of the nominal Zn content in the range of 0–50%, the out-of-plane and in-plane crystallographic characteristics of Cd1−xZnxO films grown on r-plane sapphire substrates via atmospheric pressure metal–organic chemical vapor deposition. The study is conducted to search for knowledge relating to the structural details during the transition process from a rock-salt to a wurtzite structure as the Zn content increases in this CdO–ZnO system. It has been found that it is possible to obtain films exhibiting a single (001) cubic orientation with good …

010302 applied physicsMaterials scienceScanning electron microscope02 engineering and technologyGeneral ChemistryChemical vapor deposition021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesCrystallographyTransmission electron microscopy0103 physical sciencesSapphireGeneral Materials ScienceOrthorhombic crystal systemCrystalliteMetalorganic vapour phase epitaxy0210 nano-technologyWurtzite crystal structureCrystEngComm
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Enhancement of the dielectric response through Al-substitution in La1.6Sr0.4NiO4 nickelates

2016

The structures and dielectric properties of La1.6Sr0.4Ni1−xAlxO4 (x = 0, 0.2 and 0.4) ceramics elaborated using the Pechini method were studied for the first time. The same unique tetragonal phase was found in all compounds. The lattice parameters were found using Rietveld refinement. The surface morphology characterization and elemental analysis of these samples were respectively carried out using scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDS). A giant dielectric response was observed in these ceramics, and one dielectric relaxation was found. The substitution of nickel with aluminum results in a colossal dielectric constant value (>106). The dielectric l…

010302 applied physicsMaterials scienceScanning electron microscopeRietveld refinementGeneral Chemical EngineeringAnalytical chemistrychemistry.chemical_elementMineralogy02 engineering and technologyGeneral ChemistryDielectric021001 nanoscience & nanotechnology01 natural sciencesTetragonal crystal systemNickelchemistryvisual_art0103 physical sciencesvisual_art.visual_art_mediumDielectric lossCeramic0210 nano-technologySpectroscopyRSC Advances
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Evaluation of nano/submicro pores in suspension plasma sprayed YSZ coatings

2019

Abstract Nano-submicro pores could considerably influence the coating performances and thus should be properly designed for the intended applications. However, it is challenging to characterize accurately such small pores in coatings. In this study, YSZ coatings were firstly manufactured by suspension plasma spray (SPS) and the nano-submicro pores in as-prepared coatings were investigated using Ultra-small-angle X-ray scattering (USAXS). Afterwards, a multivariate analysis on the effect of five different process parameters was carried out. The two main results showed that: 1) the nano-submicro pores content in coatings has a negative correlation with suspension mass load and powder size, an…

010302 applied physicsMaterials scienceScatteringSintering02 engineering and technologySurfaces and InterfacesGeneral ChemistrySurface finishengineering.materialCondensed Matter Physics01 natural sciencesSurfaces Coatings and Films[SPI]Engineering Sciences [physics]020303 mechanical engineering & transports0203 mechanical engineeringCoating0103 physical sciencesNano-Materials ChemistryengineeringSuspension plasma sprayComposite materialSuspension (vehicle)Yttria-stabilized zirconiaSurface and Coatings Technology
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Effect of oxidation post treatments on TiO2 coating manufactured using reactive very low-pressure plasma spraying (R-VLPPS)

2020

Abstract TiO2 coatings manufactured using reactive very low-pressure plasma spraying (R-VLPPS) were analyzed in different regions related to their position compared to the plasma flame. For that, a screen was used in order to hide an area of the substrate from the direct plasma flux. The coating morphology changed from quasi lamellar structure to highly vapor structure and coatings exhibited obvious modifications in terms of phases and mechanical properties. The effect of oxidation post treatment on the as sprayed coating was then studied by selecting two methods: in situ oxidation post treatment and classical thermal treatment. The two post treatments provided an increase of the main rutil…

010302 applied physicsMaterials scienceSubstrate (chemistry)02 engineering and technologySurfaces and InterfacesGeneral ChemistryPlasmaThermal treatmentengineering.material021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesSurfaces Coatings and Films[SPI]Engineering Sciences [physics]CoatingRutilePhase (matter)0103 physical sciencesMaterials ChemistryengineeringLamellar structureComposite material0210 nano-technologyPorositySurface and Coatings Technology
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Selective Band Gap to Suppress the Spurious Acoustic Mode in Film Bulk Acoustic Resonator Structures

2018

In this work, we investigate numerically the propagation of Lamb waves in a film bulk acoustic resonator (FBAR) structure formed by piezoelectric ZnO layer sandwiched between two Mo electrodes coupled with Bragg reflectors; the system is thus considered as a phononic-crystal (PnC) plate. The aim is to suppress the first-order symmetric Lamb wave mode considered as a spurious mode caused by the establishment of a lateral standing wave due to the reflection at the embedded lateral extremities of the structure; this spurious mode is superposing to the main longitudinal mode resonance of the FBAR. The finite element study, using harmonic and eigen-frequency analyses, is performed on the section…

010302 applied physicsMaterials sciencebusiness.industryBand gapGeneral EngineeringResonance02 engineering and technology021001 nanoscience & nanotechnologyAntiresonance01 natural sciencesStanding waveResonatorQ factor0103 physical sciencesReflection (physics)Optoelectronics0210 nano-technologybusinessSpurious relationshipJournal of Vibration and Acoustics
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Evaluation and Comparison of Novel Precursors for Atomic Layer Deposition of Nb2O5 Thin Films

2012

Atomic layer deposition (ALD) of Nb2O5 thin films was studied using three novel precursors, namely, tBuN═Nb(NEt2)3, tBuN═Nb(NMeEt)3, and tamylN═Nb(OtBu)3. These precursors are liquid at room temperature, present good volatility, and are reactive toward both water and ozone as the oxygen sources. The deposition temperature was varied from 150 to 375 °C. ALD-type saturative growth modes were confirmed at 275 °C for tBuN═Nb(NEt2)3 and tBuN═Nb(NMeEt)3 together with both oxygen sources. Constant growth rate was observed between a temperature regions of 150 and 325 °C. By contrast, amylN═Nb(OtBu)3 exhibited limited thermal stability and thus a saturative growth mode was not achieved. All films we…

010302 applied physicsMaterials scienceta114General Chemical EngineeringAnalytical chemistrychemistry.chemical_element02 engineering and technologyGeneral Chemistry021001 nanoscience & nanotechnology01 natural sciencesOxygenAmorphous solidElastic recoil detectionAtomic layer depositionchemistry0103 physical sciencesMaterials ChemistryThermal stabilityThin film0210 nano-technologyta116Volatility (chemistry)High-κ dielectricChemistry of Materials
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Atomic Layer Deposition of Osmium

2011

Growth of osmium thin films and nanoparticles by atomic layer deposition is described. The Os thin films were successfully grown between 325 and 375 °C using osmocene and molecular oxygen as precursors. The films consisted of only Os metal as osmium oxides were not detected in X-ray diffraction measurements. Also the impurity contents of oxygen, carbon, and hydrogen were less than 1 at % each at all deposition temperatures. The long nucleation delay of the Os process facilitates either Os nanoparticle or thin film deposition. However, after the nucleation delay of about 350 cycles the film growth proceeded linearly with increasing number of deposition cycles. Also conformal growth of Os thi…

010302 applied physicsMaterials scienceta114General Chemical EngineeringInorganic chemistryAnalytical chemistryNucleationchemistry.chemical_element02 engineering and technologyGeneral ChemistryChemical vapor deposition021001 nanoscience & nanotechnologyOsmocene01 natural scienceschemistry.chemical_compoundAtomic layer depositionCarbon filmchemistry0103 physical sciencesMaterials ChemistryDeposition (phase transition)OsmiumThin film0210 nano-technologyta116Chemistry of Materials
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Atomic Layer Deposition of LiF Thin Films from Lithd, Mg(thd)2, and TiF4 Precursors

2013

Lithium fluoride is an interesting material because of its low refractive index and large band gap. Previously LiF thin films have been deposited mostly by physical methods. In this study a new way of depositing thin films of LiF using atomic layer deposition (ALD) is presented. Mg(thd)2, TiF4 and Lithd were used as precursors, and they produced crystalline LiF at a temperature range of 300–350 °C. The films were studied by UV–vis spectrometry, field emission scanning electron microscopy (FESEM), X-ray diffraction (XRD), atomic force microscopy (AFM), time-of-flight elastic recoil detection analysis (ToF-ERDA), and energy dispersive X-ray spectroscopy (EDX). In addition, film adhesion was t…

010302 applied physicsMaterials scienceta214ta114Band gapGeneral Chemical EngineeringAnalytical chemistryLithium fluoride02 engineering and technologyGeneral ChemistryAtmospheric temperature range021001 nanoscience & nanotechnology01 natural sciencesElastic recoil detectionchemistry.chemical_compoundAtomic layer depositionchemistryImpurity0103 physical sciencesMaterials ChemistryThin film0210 nano-technologySpectroscopyChemistry of Materials
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Non-Linearity Extremum in Niobium Doped Potassium Tantalate

1997

We report non-linear dielectric measurements in the KTaO 3 :Nb system (x Nb ≤ 0.05). The non-linear susceptibility diverges at low temperatures and reaches maximum values in the intermediate range (0.0075 ≤ x Nb ≤ 0.02). To account for this extremum non linearity, we propose a model of temperature dependent clusters which fits with a number of experimental reports. We also suggest that this model may be applied to the related compounds SrTiO 3 :Ca and KTaO 3 :Na.

010302 applied physicsPermittivityRange (particle radiation)Materials sciencePotassiumDopingGeneral EngineeringAnalytical chemistryNiobiumchemistry.chemical_elementStatistical and Nonlinear Physics02 engineering and technologyDielectric021001 nanoscience & nanotechnology01 natural sciences3. Good healthTantalatechemistry[PHYS.HIST]Physics [physics]/Physics archivesPercolation0103 physical sciences0210 nano-technologyJournal de Physique I
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Electromechanical properties of Na 0.5 Bi 0.5 TiO 3 -SrTiO 3 -PbTiO 3 solid solutions

2018

Abstract Thorough studies of electric field-induced strain are presented in 0.4Na1/2Bi1/2TiO3-(0.6-x)SrTiO3-xPbTiO3 (NBT-ST-PT) ternary solid solutions. The increase of concentration of lead x induces crossover from relaxor to ferroelectric. Strain in a relaxor state can be described by electrostrictive behavior. The electrostrictive coefficients correspond to other well-known relaxor ferroelectrics. The concentration region with a stable ferroelectric phase revealed that the polarization dependence of strain does not exhibit nonlinearity, although they are inherent to the electric field dependence of strain. In this case, electric field dependence of strain is described in terms of the Ray…

010302 applied physicsPhase transitionMaterials scienceElectrostrictionCondensed matter physicsRayleigh law02 engineering and technologyGeneral Chemistry021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesFerroelectricitySodium bismuth titanatechemistry.chemical_compoundsymbols.namesakeDomain wall (magnetism)chemistryElectric fieldPhase (matter)0103 physical sciencessymbolsGeneral Materials Science0210 nano-technologyJournal of Physics and Chemistry of Solids
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